NILAB® is an open innovation platform founded by SILSEF in 2010, dedicated to the development of nanoimprint lithography and its applications across a wide range of domains. NILAB® brings together leading laboratories, research centers and industrial partners.

The objectives are to foster collaboration and joint development, and to facilitate access to state-of-the-art equipment, know-how and patents.

Collaborative Activities

NAPA TECHNOLOGIES and its partners collaborate in the context of private customer-related projects, as well as publicly funded programs such as ANR, French DoD, and European projects.

Activities include:

• Process development (patterns, stamps, resist patterning, etching and control)
• Applications for microelectronics, optics, tribology and more