NanoImprint LABoratory-NILAB® is an open innovation platform founded by SILSEF in 2010. It is dedicated to the development of nanoimprint lithography and its applications to a wide range of domains. NILAB® brings together leading laboratories, research centers and industrial partners. The objectives are to foster collaboration and joint development ; and to facilitate access to a large range of state of the art equipment, knowhow and patents.
SILSEF and its partners collaborate in the context of private customer related projects, as well as publicly funded programs such as ANR, French DoD, European projects. Activities include:
• Process development (patterns, stamps, resist patterning, etching and control)
• Applications for microelectronics, optics, tribology and more.